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APPARATUS FOR ELECTRO-FORMING AND APPARATUS FOR HORIZONTAL ELECTRO-FORMING

机译:电铸设备和水平电铸设备

摘要

Provided is an apparatus for electro-forming. The apparatus for electro-forming includes a plating bath which is a space where a substrate is plated and a clamp disposed within the plating bath and configured to grasp the substrate disposed in a horizontal direction. The apparatus for electro-forming further includes an assembly including an anode spaced above the substrate and connected to an external power supply and a plating solution supply unit spaced above the substrate and configured to supply a plating solution. The apparatus for electro-forming also includes a driving unit configured to reciprocate the assembly in a horizontal direction at a distance from the substrate. The assembly further includes an insulator between the anode and the plating solution supply unit.
机译:提供一种用于电铸的设备。用于电铸的设备包括:电镀槽,其是电镀基板的空间;以及夹具,其设置在电镀槽内并被构造成抓握沿水平方向设置的基板。用于电铸的设备还包括组件,该组件包括在基板上方间隔开并连接至外部电源的阳极以及在基板上方间隔开并配置为供应镀液的镀液供应单元。用于电铸的设备还包括驱动单元,该驱动单元构造成使组件在水平方向上与基板间隔开。该组件还包括在阳极和镀液供应单元之间的绝缘体。

著录项

  • 公开/公告号US2020208288A1

    专利类型

  • 公开/公告日2020-07-02

    原文格式PDF

  • 申请/专利权人 LG DISPLAY CO. LTD.;

    申请/专利号US201916730582

  • 发明设计人 BYEONGSUN YOO;WOOCHAN KIM;GOTAE KIM;

    申请日2019-12-30

  • 分类号C25D5/02;H05K3/18;C25D5/08;C25D1/10;C23C18/16;C25D17;C25D3/02;B05D1/02;

  • 国家 US

  • 入库时间 2022-08-21 11:22:22

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