首页> 外国专利> SUPER-SATURATION CURRENT FIELD EFFECT TRANSISTOR AND TRANS-IMPEDANCE MOS DEVICE

SUPER-SATURATION CURRENT FIELD EFFECT TRANSISTOR AND TRANS-IMPEDANCE MOS DEVICE

机译:超饱和电流场效应晶体管和跨阻MOS器件

摘要

The present invention relates to an improvement to a current field effect transistor and trans-impedance MOS devices based on a novel and inventive compound device structure, enabling a charge-based approach that takes advantage of sub-threshold operation, for designing analog CMOS circuits. The present invention further relates to a super-saturation current field effect transistor (xiFET), having a source, a drain, a diffusion, a first gate, and a second gate terminals, in which a source channel is defined between the source and diffusion terminals, a drain channel is defined between the drain and diffusion terminals. The first gate terminal is capacitively coupled to the source channel; and the second gate terminal is capacitively coupled to said drain channel. The diffusion terminal receives a current causing change in diffused charge density throughout said source and drain channel. The xiFET provides a fundamental building block for designing various analog circuits.
机译:本发明涉及对电流场效应晶体管和跨阻MOS器件的改进,其基于新颖和创造性的复合器件结构,使得能够利用亚阈值操作的基于电荷的方法来设计模拟CMOS电路。本发明进一步涉及一种超饱和电流场效应晶体管(xiFET),其具有源极,漏极,扩散,第一栅极和第二栅极端子,其中在源极和扩散之间限定了源极沟道。在端子之间,在漏极和扩散端子之间限定了漏极通道。第一栅极端子被电容性地耦合到源极沟道。第二栅极端子电容耦合至所述漏极沟道。扩散端子接收电流,该电流引起整个所述源极和漏极通道中的扩散电荷密度的变化。 xiFET提供了用于设计各种模拟电路的基本构建块。

著录项

  • 公开/公告号US2020027880A1

    专利类型

  • 公开/公告日2020-01-23

    原文格式PDF

  • 申请/专利权人 CIRCUIT SEED LLC;

    申请/专利号US201916586090

  • 发明设计人 SUSAN MARYA SCHOBER;ROBERT C. SCHOBER;

    申请日2019-09-27

  • 分类号H01L27/092;H01L21/8238;H01L27/02;H03F1/08;H03F3/04;H03F3/45;H03F3/16;

  • 国家 US

  • 入库时间 2022-08-21 11:21:33

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