Methods for Improving Uniformity in Substrates in a Lithographic Process

摘要

A method of processing a substrate having a metal oxide resist layer formed thereon is provided, the method including the steps of: exposing the substrate to patterning radiation to form a pattern including a plurality of features in the metal oxide resist layer; exposing a portion of the substrate including at least one of said features to conditioning radiation thereby causing shrinkage of the metal oxide resist layer in said portion. Computer programs which cause a computer apparatus to perform the above method and computer program products having such computer programs stored thereon are also provided, as are apparatuses, such as lithographic apparatuses, having a processor adapted to carry out the above method or run the above program. The methods and apparatuses can lead to an improvement in critical dimension uniformity.