首页> 外国专利> RESIN COMPOSITION FOR TEMPORARY FIXING USE, RESIN FILM FOR TEMPORARY FIXING USE, SHEET FOR TEMPORARY FIXING USE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

RESIN COMPOSITION FOR TEMPORARY FIXING USE, RESIN FILM FOR TEMPORARY FIXING USE, SHEET FOR TEMPORARY FIXING USE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

机译:用于临时固定用途的树脂组合物,用于临时固定用途的树脂膜,用于临时固定用途的板以及制造半导体装置的方法

摘要

A resin composition for temporary fixing use according to the present invention can be used for the formation of a temporary fixing material for use in a semiconductor wafer processing method comprising a temporary fixing step of temporarily fixing the semiconductor wafer onto a support with the temporary fixing material interposed therebetween, a processing step of processing the semiconductor wafer that has been temporarily fixed onto the support, and a separation step of separating the processed semiconductor wafer from the temporary fixing material, the resin composition comprising (A) a thermoplastic resin, (B) a heat-curable resin and (C) a silicone compound, and having a shear viscosity of 4000 Pa・s or less at 120°C, wherein the change ratio of the shear viscosity of the resin composition after the resin composition is allowed to leave under an atmosphere having a temperature of 25°C for seven days is within 30%.
机译:根据本发明的用于临时固定用途的树脂组合物可以用于形成用于半导体晶片处理方法的临时固定材料,该临时固定材料包括使用临时固定材料将半导体晶片临时固定到支撑体上的临时固定步骤。树脂组合物包含(A)热塑性树脂,(B),所述树脂组合物介于它们之间,该处理步骤是对已经临时固定在支撑体上的半导体晶片进行处理的步骤,以及将处理后的半导体晶片与临时固定材料分离的分离步骤。热固化性树脂和(C)有机硅化合物,在120℃下的剪切粘度为4000Pa·s以下,其中,可以使树脂组合物后的树脂组合物的剪切粘度的变化率离开。在温度为25°C的环境中放置7天在30%以内。

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