ULTRA-LARGE AREA SCANNING TYPE REACTIVE ION ETCHING MACHINE AND ETCHING METHOD

摘要

An ultra-large area scanning type reactive ion etching machine and an etching method. The ultra-large area scanning type reactive ion etching machine comprises a sample introducing chamber (101), an etching reaction chamber (102), a transition chamber (103), and an etching ion generating chamber (104). By enabling a sample holder (111) to move among the sample introducing chamber (101), the etching reaction chamber (102), and the transition chamber (103) along a scanning direction, a sample (100) placed on the sample holder (111) is scanned and etched, so that large-area, uniform and efficient etching can be implemented.