Measurement parameter selection and measurement recipe selection

摘要

For metrology targets having a first biased target structure and a second differently biased target structure generated using a patterning process, signal data for the first target structure versus signal data for the second target structure Obtaining metrology data, wherein metrology data is obtained for a plurality of different metrology recipes, each metrology recipe specifying a different metrology parameter; Determining, based on a statistical fitted curve or fitted function through metrology data for a plurality of different metrology recipes; And identifying at least two different metrology recipes having a variation in the aggregate metrology data of at least two different metrology recipes from a parameter of the reference that intersects or meets a particular threshold.