首页> 外国专利> TRANSISTOR ELEMENT TERNARY INVERTER DEVICE INCLUDING THE SAME AND METHOD OF FACBRICATING THE SAME

TRANSISTOR ELEMENT TERNARY INVERTER DEVICE INCLUDING THE SAME AND METHOD OF FACBRICATING THE SAME

机译:包括该晶体管元件的晶体管元件三元逆变器装置及其制造方法

摘要

The transistor element includes a substrate, a source region provided on the substrate, a drain region spaced apart from the source region in a direction parallel to the upper surface of the substrate, and a pair of constant current formation patterns provided adjacent to the source region and the drain region in the substrate, respectively. On the substrate, a gate electrode provided between the source region and the drain region, and a gate insulating film interposed between the gate electrode and the substrate, wherein the pair of constant current formation patterns form a constant current between the drain region and the substrate, The constant current is independent from the gate voltage applied to the gate electrode.
机译:该晶体管元件包括:基板;设置在基板上的源极区;在与基板的上表面平行的方向上与源极区隔开的漏极区;以及与该源极区相邻设置的一对恒定电流形成图案。和衬底中的漏极区。在基板上,栅极电极设置在源极区域和漏极区域之间,并且栅极绝缘膜插入在栅极电极和基板之间,其中一对恒定电流形成图案在漏极区域和基板之间形成恒定电流。 ,恒定电流与施加到栅电极的栅电压无关。

著录项

  • 公开/公告号KR20200083150A

    专利类型

  • 公开/公告日2020-07-08

    原文格式PDF

  • 申请/专利权人 울산과학기술원;

    申请/专利号KR20190081518

  • 发明设计人 김경록;정재원;최영은;김우석;

    申请日2019-07-05

  • 分类号H01L21/8238;H01L21/265;H01L27/092;H01L29/10;

  • 国家 KR

  • 入库时间 2022-08-21 11:06:29

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号