PHOTOMASK ASSEMBLY WITH REFLECTIVE PHOTOMASK AND METHOD OF MANUFACTURING A REFLECTIVE PHOTOMASK

摘要

The photomask mask assembly 900 includes a reflective photomask 100 and a protective structure 200. The reflective photomask 100 includes a substrate 110 and a reflective multilayer 120 on the first substrate surface 111 of the substrate 110 at the front side of the photomask 100. The protective structure 200 of the second substrate surface 112 of the substrate 110 is detachable from the photomask 100 at a temperature of less than 150°C on the rear side of the photomask 100.