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Zero misalignment two-via structure using optical imageable dielectric, build-up film, and electrolytic plating

机译:零错位两通孔结构,使用可成像的光学介质,积层膜和电镀

摘要

A device package and a method of forming a device package are described. The device package includes a dielectric on a conductive pad and a first via on a first seed on a top surface of the conductive pad. The device package includes a conductive trace on a dielectric and a second via on a second seed layer on the dielectric. The conductive trace is connected to the first via and the second via, and the second via is connected to the edge of the conductive trace opposite the first via. The dielectric may comprise a light imageable dielectric or build-up film. The device package may also include a seed on the dielectric prior to the conductive trace on the dielectric, a dielectric, a conductive trace, and a second dielectric on the first and second vias, the second dielectric exposing the top surface of the second via. .
机译:描述了器件封装和形成器件封装的方法。器件封装包括在导电垫上的电介质和在导电垫的顶表面上的第一种子上的第一通孔。器件封装包括在电介质上的导电迹线和在电介质上的第二种子层上的第二通孔。导电迹线连接到第一通路和第二通路,并且第二通路连接到导电迹线的与第一通路相对的边缘。电介质可以包括可光成像的电介质或堆积膜。器件封装还可以包括在电介质上的导电迹线之前的电介质上的种子,电介质,导电迹线以及第一和第二通孔上的第二电介质,第二电介质暴露第二通孔的顶表面。 。

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