ENHANCED DEFECT DETECTION IN ELECTRON BEAM INSPECTION AND REVIEW

摘要

One embodiment relates to an electron beam device for inspection and / or review. The electron source produces a primary electron beam, and the electro-optical system shapes and focuses the primary electron beam onto a sample held by the stage. The detection system detects signal-cell electrons, including secondary electrons and back-scattered electrons from the sample, and the image processing system processes the data from the detection system. The host computer system controls and coordinates the operations of the electro-optical system, detection system, and image processing system. The graphical user interface shows the parameter space and provides user selection and activation of operating parameters of the device. Another embodiment is directed to a method of detecting and / or examining defects using an electron beam apparatus. Other embodiments, aspects, and features are also disclosed.