首页> 外国专利> METHOD FOR PRODUCING TITANIUM-DOPED SILICA GLASS FOR USE IN EUV LITHOGRAPHY AND BLANK PRODUCED IN ACCORDANCE THEREWITH

METHOD FOR PRODUCING TITANIUM-DOPED SILICA GLASS FOR USE IN EUV LITHOGRAPHY AND BLANK PRODUCED IN ACCORDANCE THEREWITH

机译:制备钛白掺杂二氧化硅玻璃的方法,用于紫外光刻技术并据此空白

摘要

The Ti 3+ ions present in the Ti-doped silica glass cause browning of the glass, making inspection of the lens more difficult. Ti is performed by a sufficiently high proportion of OH groups causing internal oxidation due to external diffusion of hydrogen, or by carrying out costly pre-vitalization oxygen treatment by requiring a high treatment temperature and a special preservative furnace when the proportion of OH groups is low. It is known to ensure reduction of Ti 3+ ions for Ti 4+ ions in doped silica glass. A cost-effective method for producing Ti-doped silica glass having an internal transmittance (sample thickness of 10 mm) of 70% or more in a wavelength range of 400 nm to 1000 nm at a hydroxyl group content of less than 120 ppm, based on a flame hydrolysis soot deposition method In order to provide the present invention, it is proposed that the TiO 2 -SiO 2 soot body is subjected to a conditioning treatment including nitrogen oxide treatment prior to vitrification. The blanks prepared in this way from Ti-doped silica glass are characterized by a Ti 3+ /Ti 4+ ratio of 5 x 10 -4 or less.
机译:掺钛石英玻璃中存在的Ti 3 + 离子会导致玻璃褐变,使检查镜片变得更加困难。 Ti是由足够高比例的OH基团引起的,该羟基基团由于氢的外部扩散而导致内部氧化,或者通过在OH基团的比例低时需要较高的处理温度和特殊的防腐炉来进行昂贵的预活化氧处理。已知确保掺杂石英玻璃中Ti 4 + 离子还原Ti 3 + 离子。一种经济有效的方法,用于制造在羟基含量小于120 ppm时在400 nm至1000 nm波长范围内内部透射率(样品厚度为10 mm)为70%或更高的Ti掺杂的石英玻璃。为了提供本发明,提出对TiO 2 -SiO 2 烟灰体进行包括氮氧化物的调理处理以提供本发明。玻璃化之前的处理。以这种方式从掺钛石英玻璃制备的毛坯的特征在于,Ti 3 + / Ti 4 + 的比率为5 x 10 -4 或更少。

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