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Industrialization of a Laser Produced Plasma EUV Light Source for Lithography

机译：用于光刻的激光产生的激光产生的等离子体EUV光源的工业化

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I. Fomenkov; A. Schafgans; S. Rokitski; M. Kats; J. Stewart; A. LaForge; A. Ershov; M. Purvis; Y. Tao; M. Vargas; J. Grava; P. Das; L. Urbanski; R. Rafac; J. Lukens; C. Rajyaguru; G. Vaschenko; M. Abraham; D. Brandt; D. Brown;
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1. Development of Laser-Produced Tin Plasma-Based EUV Light Source Technology for HVM EUV Lithography [J] . JunichiFujimoto, TsukasaHori, TatsuyaYanagida, Physics Research International . 2012,第4期

机译：用于HVM EUV光刻的激光生产的基于锡等离子体的EUV光源技术的开发
2. Laser-Produced Plasma Light Sources for EUV Lithography [J] . DAVID C. BRANDT, IGOR V. FOMENKOV, BRUNO M. LA FONTAINE, Solid state technology . 2012,第5期

机译：激光产生的等离子光刻用等离子光源
3. Performance results of laser-produced plasma test and prototype light sources for EUV lithography [J] . Norbert R. Böwering Igor V. Fomenkov David C. Brandt Alexander N. Bykanov Alex I. Ershov William N. Partlo David W. Myers Nigel R. Farrar Georgiy O. Vaschenko Oleh V. Khodykin Jerzy R. Hoffman Christopher P. Chrobak Shailendra N. Srivastava Imtiaz Ahmad Chirag Rajyaguru et al. Journal of Micro/Nanolithography,MEMS and MOEMS . 2009,第4期

机译：激光产生的等离子测试和原型光源用于EUV光刻的性能结果
4. Industrialization of a laser produced plasma EUV light source for lithography [C] . I. Fomenkov, A. Schafgans, S. Rokitski, Conference on Lasers and Electro-Optics . 2017

机译：激光生产的用于光刻的等离子EUV光源的工业化
5. Radiation studies of the tin-doped microscopic droplet laser plasma light source specific to EUV lithography. [D] . Koay, Chiew-Seng. 2006

机译：EUV光刻专用的锡掺杂微滴激光等离子体光源的辐射研究。
6. Time-resolved two-dimensional profiles of electron density and temperature of laser-produced tin plasmas for extreme-ultraviolet lithography light sources [O] . Kentaro Tomita, Yuta Sato, Syouichi Tsukiyama, -1

机译：极紫外光刻光源的激光产生的锡等离子体的电子密度和温度的时间分辨二维分布
7. Present Status and Future of EUV (Extreme Ultra Violet) Light Source Research 4.Laser Produced Plasma Light Sources 4.1Present Status of Laser Produced Plasma EUV Sources Development [O] . Toshihisa TOMIE 2003

机译：EUV（极端超紫色）光源研究的现状和未来4.Aser产生的等离子体光源4.1激光产生的等离子体EUV源开发
8. Advanced source studies on laser produced plasmas for EUV lithography [R] . Spitzer, R. C. , Gaines, D. P. 1995

机译：用于EUV光刻的激光产生等离子体的高级源研究

Industrialization of a Laser Produced Plasma EUV Light Source for Lithography

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