首页> 外国专利> SiOx SiOx Layered SiOx manufacturing method thereof exfoliated SiOx nanosheet therefrom

SiOx SiOx Layered SiOx manufacturing method thereof exfoliated SiOx nanosheet therefrom

机译:SiOx SiOx层状SiOx的制造方法,由此剥落SiOx纳米片

摘要

The present invention relates to a layered SiOx, a method for manufacturing the same, and a SiOx nanosheet peeled from the same, and more specifically, unlike a conventional bulk-type SiOx, has a two-dimensional crystal structure and is excellent in peelability, so that it is peeled in the form of a nanosheet It is easy to do, and relates to a layered SiOx having a large surface area and photocatalytic properties for hydrogen storage and hydrogen generation, a method for manufacturing the same, and a SiOx nanosheet having cation selectivity peeled therefrom.
机译:本发明涉及层状SiO x,其制造方法以及从其上剥离的SiO x纳米片,更具体地,与常规的块状SiO x不同,其具有二维晶体结构并且剥离性优异,从而容易地进行剥离,并且涉及具有大表面积和用于储氢和产生氢的光催化性能的层状SiO x,其制造方法以及具有该层的SiO x纳米片。从其剥离的阳离子选择性。

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