Apparatus for vacuum processing of substrates, system for vacuum processing of substrates, and method for transport of substrate carriers and mask carriers in vacuum chambers

摘要

The present disclosure provides an apparatus 200 for vacuum processing of a substrate 10. The apparatus 200 includes a vacuum chamber, a first track arrangement 110 configured for transport of the substrate carrier 120, a second track arrangement 130 configured for transport of the mask carrier 140, and a substrate carrier 120. ) And a holding arrangement configured to position the mask carrier 140 relative to each other. The first track arrangement 110 includes a first portion configured to support the substrate carrier 120 at the first end 12 of the substrate 10 and opposite the first end 12 of the substrate 10, the substrate And a second portion configured to support the substrate carrier 120 at the second end 14 of 10. The second track arrangement 120 comprises an additional first portion configured to support the mask carrier 140 at the first end 22 of the mask 20 and opposite the first end 22 of the mask 20, It includes an additional second portion configured to support the mask carrier 140 at the second end 24 of the mask 20. A first distance (D) between a first portion and a second portion of the first track arrangement 110 and a second distance (D') between an additional first portion and an additional second portion of the second track arrangement 130 Are essentially the same.