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Method of forming a graphene membrane device, graphene membrane device, microphone and Hall sensor
Method of forming a graphene membrane device, graphene membrane device, microphone and Hall sensor
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机译:形成石墨烯膜装置的方法,石墨烯膜装置,麦克风和霍尔传感器
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摘要
A method (100) of forming a graphene membrane device (200, 300, 400, 500, 600), comprising: placing (110) a graphene membrane (220) in a relaxed state of the graphene membrane (220) on a graphene membrane (220) Surface (214) of a support substrate (210), wherein the support substrate (210) comprises an adhesion layer (213) and a bulk region (211) and wherein a portion of the graphene membrane (220) is disposed on the adhesion layer (213) the graphene membrane (220) extends over a recess (212) having an opening (216) on the surface (214) of the carrier substrate (210), and wherein the graphene membrane (220) is arranged such that a first part (212) 221) of the graphene membrane (220) is arranged on the surface (214) of the carrier substrate (210) and a second part (222) of the graphene membrane (220) is arranged above the opening (216) of the recess (212), wherein an adhesion energy between the adhesive layer (213) and the graphene membrane (220) is greater than an adhesion energy between the bulk region (211) and the graphene membrane (220); and stretching (120) the second portion (222) of the graphene membrane (220) to place the second portion (222) of the graphene membrane (220) in a tensioned condition such that the second portion (222) of the graphene membrane (220) Membrane (220) is permanently in the stressed state at an operating temperature range of the graphene membrane device (200, 300, 400, 500, 600), wherein the stressing is by inherent adhesion by attracting a third portion (223) of the graphene membrane (220) which lies between the first part (221) and the second part (222) of the graphene membrane (220), to a part of a wall (215) of the recess (212), which is formed by the adhesive layer (213) ,
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