A UV reactor 102 for use in a water treatment system comprises a flow chamber 104 having a longitudinal axis, an input 106 for entry of water into the flow chamber and an output 108 for water to exit the flow chamber. The UV reactor comprises at least one UV lamp 110 comprising a length which is provided in the direction of the longitudinal axis of the flow chamber, wherein water flowing in the flow chamber can be exposed to UV radiation. The UV reactor also comprises at least one baffle 114 provided within the flow chamber and configured to impede water flowing along the flow path. The input comprises a tapered pipe 106a, such that the cross-sectional area of the input pipe gradually reduces along the length of the pipe, the end of the pipe having the smallest cross-sectional area being coupled to the flow chamber. Suitably, the at least one baffle comprises a series of baffles which may be angularly offset around the longitudinal axis or axially offset in the direction of the longitudinal axis.
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