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Design method for mask layout, OPC(Optical Proximity Correction) method, and methods for manufacturing mask using the OPC method
Design method for mask layout, OPC(Optical Proximity Correction) method, and methods for manufacturing mask using the OPC method
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机译:掩模版图的设计方法,OPC(光学接近度校正)方法以及使用OPC方法制造掩模的方法
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摘要
The technical idea of the present invention is a mask layout design method, an OPC method, and a mask using the OPC method, which can effectively control a corner notch of a rectangular notch in a multi-height cell and realize a multi-height cell as one mask. Provide a manufacturing method. The mask layout design method is a layout design method for a pattern on a mask for forming a target pattern of a multi-height cell including a rectangular notch portion, which corresponds to the notch portion. Design a layout including a hexagonal notch design in which at least one side of the rectangular pattern on the mask is transformed into a hexagonal pattern.
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