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Investigating the Factors Governing the Efficiency and the Electroluminescence Stability in Simplified Phosphorescent Organic Light-Emitting Devices Utilizing One Material for Both Hole Transport and Emitter Host

机译:研究使用一种材料同时用于空穴传输和发射体的简化磷光有机发光器件的效率和电致发光稳定性的控制因素

摘要

Organic Light-Emitting Devices (OLEDs) have reached industrial maturity in display technology, since OLEDs provide salient advantages such as high brightness, fast response, wide viewing angle, mechanical flexibility, and low cost manufacturing. Due to the ability of electroluminescence (EL) from triplet excited states as well as singlet excited states, phosphorescent OLEDs (PHOLEDs) have a potential to achieve 100% internal quantum efficiency. Therefore, PHOLEDs can offer a competitive external quantum efficiency. However, the operational stability of PHOLEDs is relatively poor. Several mechanisms have been proposed to address the chemical and physical phenomena associated with intrinsic degradation of PHOLEDs, nevertheless, the reasons behind voltage rise and luminance loss accompanying PHOLEDs long term operation are not yet well understood. The state of the art p-i-n PHOLEDs offer relatively high efficiency and low efficiency roll-off. However, this technology is characterized by structure complexity. Therefore, much of the current research on PHOLEDs focuses on the development of the simplest possible and most easily processed architecture that can deliver the optimal combination of device properties. Simplified PHOLEDs, utilizing one material for both hole transport and emitter host, can be a good candidate for replacement of p-i-n technology. Simplified PHOLEDs offer higher efficiency than the p-i-n PHOLEDs , yet, their EL stability is found to be poor.In this thesis, the role of the ITO/organic interface on simplified PHOLEDs efficiency will be investigated. Furthermore, possible degradation mechanisms at the ITO/organic interface will be explored. Moreover, we will correlate degradation at the ITO/organic interface to PHOLEDs operational stability. Eventually, organic layers modifications including but not limited to emissive layer (EML) will be examined.By studying the indium tin oxide (ITO)/organic interface in simplified PHOLEDs, it was found that this interface is critical to PHOLEDs performance. The study shows that, this interface is critical to the PHOLED overall stability and is considered as one of the limiting factors of the long term operational stability of simplified PHOLEDs. The effect of optical excitation on the ITO/organic interface stability in hole-only devices was investigated. It was found that the ITO/organic interface is susceptible to exciton-induced degradation. This degradation affects the device stability severely compared to current-induced degradation. The exciton-induced degradation can be prevented by doping the hole transport layer (HTL), at the interface with an exciton quencher layer or by blocking the electrons from leaking to the ITO/organic interface that may further recombine with holes to form excitons. Further studies showed that upon combining both electrical stress and optical excitation, the device degradation is even more pronounced which is most likely due to interactions between charges and excitons. By using exciton life-time measurements, a new role of molybdenum trioxide (MoO3) in the electrical stability of PHOLEDs, as an exciton quencher layer, is introduced.Delayed EL (DEL) measurements showed that the simplified PHOLEDs are susceptible to triplet-triplet annihilation (TTA) and triplet-polaron quenching (TPQ) which might affect the operational stability of simplified PHOLEDs. Finally, EML modifications showed that the recombination zone of simplified PHOLEDs is located near the HTL/EML interface.
机译:由于有机发光器件(OLED)具有显着的优势,例如高亮度,快速响应,宽视角,机械柔韧性和低成本制造,因此有机发光器件(OLED)在显示技术中已达到工业成熟。由于三重激发态和单重激发态的电致发光(EL)能力,磷光OLED(PHOLED)有望实现100%的内部量子效率。因此,PHOLED可以提供具有竞争力的外部量子效率。然而,PHOLED的操作稳定性相对较差。已经提出了几种机制来解决与PHOLED的固有降解有关的化学和物理现象,但是,尚未充分理解伴随PHOLED长期工作的电压升高和亮度损失背后的原因。最新的p-i-n PHOLED提供相对较高的效率和较低的效率下降。但是,该技术的特征在于结构复杂。因此,当前有关PHOLED的许多研究都集中在最简单,最容易处理的体系结构的开发上,该体系结构可以提供器件性能的最佳组合。利用一种材料同时进行空穴传输和发射极主体的简化PHOLEDs可以很好地替代p-i-n技术。简化的PHOLED的效率要高于p-i-n PHOLED,但其EL稳定性却很差。本文研究了ITO /有机界面对简化的PHOLED效率的作用。此外,将探索ITO /有机界面处可能的降解机理。此外,我们会将ITO /有机界面处的降解与PHOLED的操作稳定性相关联。最终,将研究包括但不限于发射层(EML)在内的有机层改性。通过研究简化的PHOLED中的氧化铟锡(ITO)/有机界面,发现该界面对PHOLED的性能至关重要。研究表明,该接口对于PHOLED的整体稳定性至关重要,并且被视为简化PHOLED的长期运行稳定性的限制因素之一。研究了光激发对仅空穴器件中ITO /有机界面稳定性的影响。发现ITO /有机界面易受激子诱导的降解。与电流引起的退化相比,这种退化严重影响了器件的稳定性。可以通过在与激子猝灭剂层的界面处掺杂空穴传输层(HTL)或通过阻止电子泄漏到ITO /有机界面来阻止激子诱导的降解,该电子可能进一步与空穴复合形成激子。进一步的研究表明,在将电应力和光激发结合起来时,器件的退化更为明显,这很可能是由于电荷和激子之间的相互作用所致。通过使用激子寿命测量,介绍了三氧化钼(MoO3)作为激子猝灭剂层在PHOLED的电稳定性中的新作用。延迟EL(DEL)测量表明,简化的PHOLED易受三重态三重态的影响。灭(TTA)和三重极化子猝灭(TPQ),这可能会影响简化的PHOLED的操作稳定性。最后,EML修改显示简化的PHOLED的重组区位于HTL / EML接口附近。

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  • 作者

    Abdelmalek Mina;

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  • 年度 2013
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