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High-contrast self-imaging with ordered optical elements

机译:具有有序光学元件的高对比度自成像

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摘要

Creating arbitrary light patterns finds applications in various domainsincluding lithography, beam shaping, metrology, sensing and imaging. We studythe formation of high-contrast light patterns that are obtained by transmissionthrough an ordered optical element based on self-imaging.By applying thephase-space method, we explain phenomena such as the Talbot and the angularTalbot effects. We show that the image contrast is maximum when the source iseither a plane wave or a point source, and it has a minimum for a source withfinite spatial extent. We compare these regimes and address some of theirfundamental differences. Specifically, we prove that increasing the sourcedivergence reduces the contrast for the plane wave illumination but increasesit for the point source. Also, we show that to achieve high contrast with apoint source, tuning the source size and its distance to the element iscrucial.We furthermore indicate and explore the possibility of realizing highlycomplex light patterns by using a periodic transmission element. These patternscan have more spots in the far field than the number of diffraction orders ofthe periodic element. We predict that the ultimate image contrast is smallerfor a point source compared to a plane wave. Our simulations confirm that thesmallest achievable spot size in the image is imposed by diffraction regardlessof the imaging regime. Our research can be applied to similar domains e.g.quantum systems.
机译:创建任意的光图案可在各种领域中找到应用,包括光刻,光束整形,计量,传感和成像。我们研究了通过自成像通过有序光学元件透射而获得的高对比度光图案的形成。通过应用相空间方法,我们解释了诸如塔尔伯特效应和角度塔尔伯特效应的现象。我们表明,当源是平面波源或点源时,图像对比度最大,而对于空间范围有限的源,图像对比度最小。我们比较了这些制度,并解决了它们的一些根本差异。具体来说,我们证明增加源散度会降低平面波照明的对比度,但会增加点源的对比度。此外,我们表明,要与点光源实现高对比度,调整光源的大小及其到元件的距离至关重要。我们进一步指出并探讨了使用周期性透射元件实现高度复杂的光图案的可能性。这些图案在远场中具有比周期性元素的衍射级数更多的斑点。我们预测,与平面波相比,点源的最终图像对比度较小。我们的模拟结果证实,无论成像方式如何,衍射中都会施加图像中最小的可达到的光斑大小。我们的研究可以应用于类似的领域,例如量子系统。

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