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Comparison of Z-scan and THG derived nonlinear index of refraction in selected organic solvents

机译:比较Z-扫描和THG得到的非线性折射率在选定的有机溶剂中

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摘要

Nonlinear index of refraction of a series of organic solvents, measured by the nonlinear imaging (z-scan) technique, is compared with the same values derived from optical third-harmonic generation (THG). The systematic differences in the values obtained from the z-scan measurements and from THG are attributed to three factors: the value of the standard used in THG measurements, important rotational contribution in z-scan measurements, and the difference in dispersion for n2 derived from Kerr susceptibility and those derived from THG measurements. Using the recently proposed standard silica susceptibility value, one obtains a very good agreement for silica and significant differences for the solvents, particularly for CS2 and chlorobenzene. A correction based on a three-level model for centrosymmetric media is applied for dispersion.
机译:将通过非线性成像(z扫描)技术测量的一系列有机溶剂的非线性折射率与光学三次谐波生成(THG)得出的相同值进行比较。从z扫描测量值和THG获得的值的系统性差异归因于三个因素:THG测量中使用的标准品的值,z扫描测量中重要的旋转贡献以及从中得出的n2的色散差异Kerr磁化率以及从THG测量得出的磁化率。使用最近提出的标准二氧化硅敏感性值,人们对二氧化硅获得了很好的一致性,并且对溶剂,特别是对CS2和氯苯的溶剂也有了显着差异。将基于三级模型的中心对称介质的校正应用于色散。

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