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Direct Mixing Cleaning Method of Aqua Regia on Wafer

机译：晶圆上aqua Regia的直接混合清洗方法

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Hajime Ugajin; Hayato Iwamoto; B Kei Kinoshita;
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2. Direct Mixing Cleaning Method of Aqua Regia on Wafer [J] . Hajime Ugajin, Hayato Iwamoto, Kei Kinoshita Diffusion and Defect Data. Solid State Data, Part B. Solid State Phenomena . 2005,第0期

机译：威化饼上晶圆的直接混合清洗方法
3. Collection efficiency of noble metallic contaminants on Si wafers with HF-Aqua Regia mixtures for VPD-DC ICPMS analysis [J] . M. Devita, H. Fontaine, N. Drogue, Diffusion and Defect Data. Solid State Data, Part B. Solid State Phenomena . 2015,第Null期

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5. Direct Mixing Cleaning Method of Aqua Regia on Wafer [C] . Hajime Ugajin, Hayato Iwamoto, Kei Kinoshita, International Symposium on Ultra Clean Processing of Silicon Surfaces . 2005

机译：晶圆上的Aqua Regia的直接混合清洁方法
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