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Collection efficiency of noble metallic contaminants on Si wafers with HF-Aqua Regia mixtures for VPD-DC ICPMS analysis

机译：使用HF-aqua Regia混合物在si晶片上收集贵金属污染物的效率，用于VpD-DC ICpms分析

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M. Devita; H. Fontaine; N. Drogue; D. Mathiot; V. Enyedi; T. Lardin;
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年度 2016
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1. Collection efficiency of noble metallic contaminants on Si wafers with HF-Aqua Regia mixtures for VPD-DC ICPMS analysis [J] . M. Devita, H. Fontaine, N. Drogue, Diffusion and Defect Data. Solid State Data, Part B. Solid State Phenomena . 2015,第Null期

机译：HF-Aqua Regia混合物对硅晶片上贵金属污染物的收集效率，用于VPD-DC ICPMS分析
2. Investigation of metallic contamination analysis using vapor phasedecomposition – droplet collection – total reflection X-ray fluorescence(VPD-DC-TXRF) for Pt-group elements on silicon wafers [J] . David Hellin, Nick Valckx, Jens Rip, Diffusion and Defect Data. Solid State Data, Part B. Solid State Phenomena . 2008,第Null期

机译：使用气相分解–液滴收集–全反射X射线荧光（VPD-DC-TXRF）对硅晶片上的Pt组元素进行金属污染分析的研究
3. Investigation of metallic contamination analysis using vapor phase decomposition - droplet collection - total reflection X-ray fluorescence VPD-DC-TXRF) for Pt-group elements on silicon wafers [J] . David Hellin, Nick Valckx, Jens Rip, Diffusion and Defect Data. Solid State Data, Part B. Solid State Phenomena . 2008,第0期

机译：使用气相分解-液滴收集-全反射X射线荧光VPD-DC-TXRF）对硅晶片上的Pt组元素进行金属污染分析的研究
4. Collection efficiency of noble metallic contaminants on Si wafers with HF-Aqua Regia mixtures for VPD-DC ICPMS analysis [C] . M. Devita, H. Fontaine, N. Drogue, International symposium on ultra clean processing of semiconductor surfaces . 2015

机译：HF-Aqua Regia混合物对硅晶片上贵金属污染物的收集效率，用于VPD-DC ICPMS分析
5. Development and validation of a method for accurate collection and analysis of select antineoplastic contaminants, both in air and on surfaces, and implications for exposure assessment. [D] . Larson, Rodney Raymond. 2001

机译：开发和验证一种方法，用于准确收集和分析空气中和表面上的精选抗肿瘤污染物，并对暴露评估产生影响。
6. Improvement of polycrystalline silicon wafer solar cell efficiency by forming nanoscale pyramids on wafer surface using a self-mask etching technique [O] . Hsin-Han Lin, Wen-Hwa Chen, Franklin C.-N. Hong -1

机译：通过使用自掩膜蚀刻技术在晶圆表面形成纳米级金字塔提高多晶硅晶圆太阳能电池效率
7. A top-down, three-scale numerical analysis of wafer-to-wafer metallic bonding [O] . A. Ghisi, S. Mariani, A. Corigliano, 2014

机译：自上而下的三尺度晶圆间金属键合数值分析
8. Systematic Error in Isotopic Analysis of Noble Gas Mixtures [R] . Ellefson, R. E. 1981

机译：贵气混合物同位素分析的系统误差

Collection efficiency of noble metallic contaminants on Si wafers with HF-Aqua Regia mixtures for VPD-DC ICPMS analysis

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