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Microcharacterisation of bulk, ion beam processed and nanoparticle cadmium sulphide (CdS)

机译:本体,离子束处理和纳米级硫化镉(CdS)的微表征

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摘要

Cadmium sulphide (CdS) is a II-VI semi-conductor with a direct band gap of 2.42 eV for the hexagonal crystal structure at room temperature. CdS is an important electronic and optoelectronic material with applications in light-emitting diodes, lasers, flat panel displays, etc. Bulk CdS crystals at three different orientations were modified using a Ga+ focused ion beam (FIB). The effects of this modification were investigated using Atomic Force Microscopy (AFM), Kelvin Probe Microscopy (KPM) and Cathodoluminescence (CL) techniques. These techniques provide information about the morphology, contact surface potential and crystal structure (including defect structure, impurities etc) of the semiconductor crystal. All of these factors are important in any subsequent application of the CdS. The bulk crystals were prepared either by mechanical polishing or by Ga+ ion beam polishing. It was found that the Ga+ ion beam sputtering depths increased linearly with exposure to the beam and at the same rate for each crystal orientation. The contact surface potential in the mechanically polished crystals increased quickly with dose until an equilibrium was reached, but in the ion beam polished samples the increase in contact surface potential was linear. The UV-visible CL spectra (1.3 – 6 eV) for the bulk crystals consisted of two peaks – the intrinsic peak at ~ 2.42 eV and a defect peak at ~ 1.7 eV. The CL emission was highly sensitive to the scratch damage caused by the mechanical polishing. Ion beam polishing removed most of the scratch damage and allowed the effect of ion beam sputtering to be investigated. The intensity of the defect peak did not change significantly with dose. The intrinsic peak was initially reduced in intensity and then increased to an equilibrium point.The CL characteristics of cadmium sulphide powder crystals were also investigated and compared to the characteristics of CdS microstructures of similar size patterned using the FIB. The characteristics of the powder and the patterned structures were similar.This study shows that AFM, KPM and CL are all useful techniques for the characterization of FIB modified CdS.
机译:硫化镉(CdS)是一种II-VI半导体,在室温下对于六方晶体结构的直接带隙为2.42 eV。 CdS是一种重要的电子和光电材料,可用于发光二极管,激光器,平板显示器等。使用Ga +聚焦离子束(FIB)改性了三种不同方向的块状CdS晶体。使用原子力显微镜(AFM),开尔文探针显微镜(KPM)和阴极发光(CL)技术研究了这种修饰的效果。这些技术提供有关半导体晶体的形态,接触表面电势和晶体结构(包括缺陷结构,杂质等)的信息。所有这些因素在CdS的任何后续应用中都很重要。通过机械抛光或通过Ga +离子束抛光制备块状晶体。已经发现,Ga +离子束的溅射深度随着暴露于该束而线性增加,并且对于每个晶体取向以相同的速率增加。机械抛光晶体中的接触表面电势随剂量迅速增加,直到达到平衡为止,但是在离子束抛光样品中,接触表面电势的增长呈线性。大块晶体的紫外可见CL光谱(1.3 – 6 eV)由两个峰组成–在〜2.42 eV处的本征峰和在〜1.7 eV处的缺陷峰。 CL发射对由机械抛光引起的刮擦损伤高度敏感。离子束抛光消除了大部分刮擦损伤,并可以研究离子束溅射的效果。缺陷峰的强度没有随剂量而明显变化。本征峰的强度最初降低,然后增加到平衡点。还研究了硫化镉粉末晶体的CL特性,并将其与使用FIB图案化的类似尺寸的CdS微结构的特性进行了比较。粉末的特征和构图结构相似。这项研究表明,AFM,KPM和CL都是表征FIB改性CdS的有用技术。

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