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Electronic transport of low dimensional holes in induced p-type GaAs devices

机译:感应p型GaAs器件中低维空穴的电子传输

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摘要

In this thesis we study low dimensional hole systems fabricated on GaAs/AlGaAsheterostructures without any modulation dopants. The electrical transports of holes in twodimensions (2D), one dimension (1D) and zero dimension (0D) are studied. Two types of fieldeffect transistors are fabricated and studied. The first type is a semiconductor insulatorsemiconductor field effect transistor (SISFET) in which 1D hole wires and a hole quantum dotare studied. The second type is a metal insulator semiconductor field effect transistor(MISFET) in which devices with the ability to switch the type of charge carriers in theconduction channel between electrons and holes are fabricated (ambipolar devices).The 1D hole wires are fabricated on the crystal plane of (100). The 1D hole wires showstrong Zeeman splitting when the in-plane magnetic field is applied parallel to the 1D wires,and very small Zeeman splitting when the in-plane magnetic field is applied perpendicular tothe 1D wires, regardless of the crystallographic orientation ([ 011] or [011 ̅] ). This effect isdifferent compared to 1D hole wires fabricated on the crystal plane of (311)A, where there isan interplay between anisotropies due to the low crystal symmetry and 1D confinementresulting in different Zeeman splitting measured in wires oriented in differentcrystallographic orientations.We then move onto the fabrication and study of a single hole transistor in a GaAs/AlGaAsheterostructure. The Coulomb blockade oscillations resulting from single hole chargestunnelling on/off the quantum dot are observed and we also measure the charging energy ofthe quantum dot with source-drain bias spectroscopy. The quantum dot is found to be morestable and has less electrical noise compared to a single electron transistor fabricated onsilicon, and compares favourably with an electron quantum dot fabricated on a GaAs/AlGaAsheterostructure with modulation dopants.We also fabricated the first ambipolar devices on a GaAs/AlGaAs heterostructure with theMISFET design and characterised these devices at low temperatures. Firstly the chargetransport of electrons and holes are compared directly in a 2D ambipolar device bymeasuring the density dependence of the carrier mobility. It is observed that the electronmobility can be modelled with charge scattering theories taking into account backgroundimpurity scattering, interface roughness scattering and screening. However, when the samefitting parameters are used to model the hole mobility by switching the effective mass ofelectrons to holes, the theory cannot fit the experimental hole mobility. Several possibilitiesfor the deviation of the calculations are discussed but further experimental and theoreticalworks need to be conducted in order to determine the exact cause for this deviation.Finally we characterised ambipolar 1D wires where both electrons and holes can bemeasured. Ballistic transport of both types of charge carriers is observed and we comparethe 1D subband spacings of electrons to holes.
机译:在本文中,我们研究了在无任何调制掺杂剂的GaAs / AlGaA异质结构上制造的低维空穴系统。研究了空穴在二维(2D),一维(1D)和零维(0D)中的电输运。制造并研究了两种类型的场效应晶体管。第一类是研究一维空穴线和空穴量子点的半导体绝缘体半导体场效应晶体管(SISFET)。第二种是金属绝缘体半导体场效应晶体管(MISFET),其中制造了具有在电子和空穴之间的导电沟道中切换载流子类型的能力的器件(双极器件)。一维空穴线在晶体上制造(100)的平面。一维孔线在平行于一维线施加平面内磁场时显示出很强的塞曼分裂,而无论晶向如何,当垂直于一维线施加面内磁场时,塞曼分裂都非常小([011]或[011̅])。与在(311)A晶面上制造的一维孔线相比,这种效应是不同的,在该孔中,由于低晶体对称性和一维限制导致各向异性(由于在不同晶体取向下测量的线中测得的塞曼分裂不同),各向异性之间存在相互作用。 GaAs / AlGaASheterostructure中的单孔晶体管的制造和研究。观察到由单孔电荷激励量子点开/关引起的库仑阻塞振荡,并且我们还使用源漏偏压光谱法测量了量子点的电荷能。与在硅上制造的单个电子晶体管相比,该量子点被发现更稳定并且具有更低的电噪声,并且与在具有调制掺杂剂的GaAs / AlGaA异质结构上制造的电子量子点相比具有优势。我们还在GaAs上制造了第一个双极器件。 / AlGaAs异质结构采用MISFET设计并在低温下表征了这些器件。首先,通过测量载流子迁移率的密度依赖性,在2D双极性器件中直接比较电子和空穴的电荷传输。可以观察到,可以用电荷散射理论对电子迁移率进行建模,该理论考虑了背景杂质散射,界面粗糙度散射和屏蔽。但是,当使用相同的拟合参数通过将有效电子质量转换为空穴来模拟空穴迁移率时,该理论无法拟合实验的空穴迁移率。讨论了计算偏差的几种可能性,但需要进行进一步的实验和理论研究以确定这种偏差的确切原因。最后,我们对双极性一维导线进行了表征,可以在其中测量电子和空穴。观察到两种类型的载流子的弹道传输,并且我们比较了电子到空穴的一维子带间距。

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