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Characterization of the Photosensitive Response in Polysilane-based Organic/Inorganic Hybrid Materials

机译:聚硅烷类有机/无机杂化材料中光敏反应的表征

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摘要

The motivation for the current work stems from a unique application, i.e. the photopatterning of optical functionality in a photosensitive material immediately prior to use. In this case, optical devices such as diffraction gratings and optical interconnects are produced in thin films using integrated photonic sources under relatively uncontrolled environmental conditions. The compatibility of the material photoexcitation mechanism with wavelength and fluence levels available from compact solid-state optical sources and the need to understand the impact of local atmospheric composition and temperature on the photosensitive material response are therefore of primary concern. The primary goal of the current study was to investigate photoexcitation mechanisms and photoinduced optical and structural changes in promising candidate material systems for this application: polysilane and polygermane-based molecular hybrid polymers. The work pursued the development of a fundamental understanding of the key photophysical and photostructural responses of thin films composed of both pure, linear-chain polysilanes and of a Ge-Si copolymer. The effects of molecular modifications to the polymers, including polymer backbone catenate structure and side-group identity, on the optical and photosensitive behavior observed in these systems are examined. Through such effort, an understanding of how such structural characteristics influence key photosensitive properties, i.e. the excitation wavelength and the resulting photoinduced optical property changes, was attained. A related objective in the present work was to characterize the thermal stability of these hybrid polymers, specifically in terms of the effect of thermal treatment on as-deposited and photomodified materials. In this case, an evaluation of the similarities and differences in structural modification in response to both thermal and optical fields was pursued. The primary mechanism associated with the photoinduced phenomena observed in both polysilane and polygermane involves backbone chain scissioning and the formation of silane-radicals upon absorption of near-UV (λ ≈ 300 to 400 nm) photons, resonant with the lowest energy, σ - σ* (HOMO-LUMO) transition of the Group IVA backbone. The final photoproducts obtained result from a mixture of different competing processes which occur subsequent to this initial photoscissioning. In aerobic atmospheric environments, the radicals formed capture oxygen and form oxide linkages forming the dominant photoproducts. On the other hand, under anaerobic conditions, photooxidation is suppressed while hydride passivation of the radical dominates the response. The oxidized product, resulting from irradiation under the aerobic environment, exhibited higher refractive index changes than irradiation under anaerobic conditions. Photoexcitation using higher energy photons (typically λ ≈ 230 to 300 nm) are resonant with side-group transitions associated with π-conjugated states of the cyclic moieties. Under these conditions, the excitation accesses both these organic side-groups as well as the Group IVA backbone structure. Such excitation conditions resulted in a larger photoinduced structural modification in the irradiated polymer, as observed both in terms of its electronic structure as well as the resulting refractive index change. Thermally induced structural modification to the backbone and side-group moieties were found to be qualitatively similar those produced under optical irradiation. For example, the primary structural changes were again associated with backbone chain scissioning. Photoinduced structural modifications through resonant optical excitation of the material, however, tended to be more focused on the specific structural moieties accessed.
机译:当前工作的动机来自于独特的应用,即在使用前立即在感光材料中对光学功能进行光图案化。在这种情况下,在相对不受控制的环境条件下,使用集成的光子源,可在薄膜中生产诸如衍射光栅和光学互连的光学设备。因此,材料光激发机制与可从紧凑型固态光源获得的波长和注量能级的兼容性以及理解局部大气成分和温度对光敏材料响应的影响的需求是主要关注的问题。当前研究的主要目标是研究光激发机理以及光激发的光学和结构变化,该材料在该应用中很有前途:聚硅烷和基于聚锗烷的分子杂化聚合物。这项工作是对由纯线性链状聚硅烷和Ge-Si共聚物组成的薄膜的关键光物理和光结构响应的基本理解的发展。考察了分子改性对聚合物的影响,包括聚合物主链的连接结构和侧基同一性,对在这些系统中观察到的光学和光敏行为的影响。通过这样的努力,获得了对这样的结构特性如何影响关键的光敏性能,即激发波长和所产生的光致光学性能变化的理解。本工作的一个相关目标是表征这些杂化聚合物的热稳定性,特别是根据热处理对沉积和光改性材料的影响。在这种情况下,寻求对响应于热场和光场的结构修改的相似性和差异进行评估。与在聚硅烷和聚锗烷中观察到的光致现象相关的主要机理包括主链断裂和吸收近紫外光(λ≈300至400 nm)时以最低能量σ-σ共振时形成硅烷自由基。 *(HOMO-LUMO)IVA组主干的过渡。最终的光产物是由不同竞争过程的混合物产生的,这些竞争过程是在此初始光解之后发生的。在有氧的大气环境中,形成的自由基捕获氧并形成氧化物键,形成主要的光产物。另一方面,在厌氧条件下,光氧化被抑制,而自由基的氢化物钝化则主导了反应。在有氧环境下照射产生的氧化产物比在无氧条件下照射表现出更高的折射率变化。使用较高能量的光子(通常为λ≈230至300 nm)进行光激发,会与与环状部分的π共轭状态相关的侧基跃迁产生共振。在这些条件下,激发作用会同时到达这些有机侧基和IVA组主链结构。这种激发条件在被辐照的聚合物中产生了更大的光致结构改性,就其电子结构以及所产生的折射率变化而言,都可以观察到。发现对骨架和侧基部分的热诱导结构修饰在质量上类似于在光学照射下产生的那些。例如,主要的结构变化再次与主链断裂有关。然而,通过材料的共振光学激发进行的光诱导结构修饰趋向于更集中于所获得的特定结构部分。

著录项

  • 作者

    Chandra Haripin;

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  • 年度 2007
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  • 原文格式 PDF
  • 正文语种 EN
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