We discuss the susceptibility of zinc-blende semiconductors to band-structure modification by insertion of small atoms at their tetrahedral interstitial states. GaP is found to become a direct-gap semiconductor with two He atoms present at its interstitial sites; Si does not. Analysis of the factors controlling these filling-induced electronic modifications allows us to predict that LiZnP [viewed as a zinc-blende-like (ZnP)– lattice partially filled with He-like Li+ interstitials], as well as other members of the Nowotny-Juza compounds AIBIICV, are likely to be a novel group of direct-gap semiconductors.
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机译:我们讨论了通过将小原子插入其四面体间隙状态来对共混锌半导体进行能带结构修饰的敏感性。发现GaP成为直接间隙半导体,在其间隙位置存在两个He原子。 does没有。通过分析控制这些填充物诱导的电子修饰的因素,我们可以预测LiZnP [被视为部分由He-like Li +间隙填充的锌-闪锌矿样(ZnP)–晶格],以及Nowotny- Juza化合物AIBIICV可能是一组新的直接间隙半导体。
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