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Temperature Dependence of Electron Tunneling between Two Dimensional Electron Gas and Si Quantum Dots

机译:二维电子气与Si量子点之间电子隧穿的温度依赖性

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摘要

Quantum mechanical electron tunneling has potential applications in both science and technology, such as flash memories in modern LSI technologies and electron transport chains in biosystems. Although it is known that one-dimensional quantum electron tunneling lacks temperature dependence, the behavior of electron tunneling between different dimensional systems is still an open question. Here, we investigated the electron tunneling between a two-dimensional electron gas (2DEG) and zero-dimensional Si quantum dots and discovered an unexpected temperature dependence: At high temperature, the gate voltage necessary for electron injection from 2DEG to Si quantum dots becomes markedly small. This unusual tunneling behavior was phenomenologically explained by considering the geometrical matching of wave functions between different dimensional systems. We assumed that electron tunneling would occur within a finite experimental measurement time. Then, the observed electron tunneling is explained only by the contributions of wave packets below the quantum dot with a finite lifetime rather than the ordinary thermal excited states of 2DEG.
机译:量子机械电子隧道技术在科学和技术领域都有潜在的应用,例如现代LSI技术中的闪存和生物系统中的电子传输链。尽管已知一维量子电子隧穿不依赖于温度,但是不同维系统之间电子隧穿的行为仍然是一个悬而未决的问题。在这里,我们研究了二维电子气(2DEG)和零维Si量子点之间的电子隧穿,发现了意料之外的温度依赖性:在高温下,从2DEG注入Si量子点所需的电子注入所需的栅极电压显着升高小。通过考虑不同尺寸系统之间波函数的几何匹配,从现象学上解释了这种异常的隧穿行为。我们假设电子隧穿将在有限的实验测量时间内发生。然后,仅通过具有有限寿命的量子点下方的波包的贡献而不是2DEG的普通热激发态来解释观察到的电子隧穿。

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