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Protective nature of nano-TiN coatings shaped by EPD on Ti substrates

机译:EPD对Ti基体形成纳米TiN涂层的保护性

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摘要

The hardness and corrosion resistance of TiN coatings, processed by Electrophoretic Deposition (EPD) to cover polished and unpolished Ti substrates, have been evaluated. A deposition time of 5 min has been enough to obtain a cohesive layer of 7–8 μm in thickness. The coatings were thermally treated in vacuum atmosphere at 1200 °C for 1 h with heating and cooling rates of 5 °C min−1. The surfaces have been covered homogeneously optimizing the properties of the Ti substrates. Uniform and dense TiN coatings have been obtained onto polished substrates, while on unpolished Ti the nitrogen diffuses toward the substrate, moderately dissolving TiN coating. The nanohardness values of the polished samples have been increased from 2.8–4.8 GPa up to 6.5–8.5 GPa. Besides, the corrosion current density has been reduced more than one order of magnitude obtaining a protective efficiency of 82%. These values have been compared with other works in literature where authors used complex and costly processing techniques, demonstrating the strong impact of the colloidal processing over the specific properties of the material.
机译:已经评估了通过电泳沉积(EPD)处理的TiN涂层的硬度和耐蚀性,以覆盖抛光和未抛光的Ti基体。 5分钟的沉积时间足以获得厚度为7–8μm的粘结层。将涂层在真空气氛中于1200°C热处理1 h,加热和冷却速率为5°C min-1。表面被均匀地覆盖,从而优化了Ti基板的性能。已经在抛光的基底上获得了均匀且致密的TiN涂层,而在未抛光的Ti上,氮向基底扩散,适度溶解了TiN涂层。抛光样品的纳米硬度值已从2.8–4.8 GPa增加到6.5–8.5 GPa。此外,腐蚀电流密度降低了一个数量级以上,从而获得了82%的保护效率。这些值已与其他文献中的作者进行了比较,在这些文献中作者使用了复杂且昂贵的加工技术,证明了胶体加工对材料特定性能的强大影响。

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