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High-photosensitive resin for super-resolution direct-laser-writing based on photoinhibited polymerization

机译:基于光尿液聚合的超分辨率直激 - 写入的高光敏树脂

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摘要

An ethoxylated bis-phenol-A dimethacrylate based photoresin BPE-100 of relatively high photosensitivity and modulus is used for the creation of sub-50 nm features. This is achieved by using the direct laser writing technique based on the single-photon photoinhibited polymerization. The super-resolution feature is realized by overlapping two laser beams of different wavelengths to enable the wavelength-controlled activation of photoinitiating and photoinhibiting processes in the polymerization. The increased photosensitivity of the photoresin promotes a fast curing speed and enhances the photopolymerization efficiency. Using the photoresin BPE-100, we achieve 40 nm dots for the first time in the super-resolution fabrication technique based on the photoinhibited polymerization, and a minimum linewidth of 130 nm. The influence of the power of the inhibiting laser and the exposure time on the feature size is studied and the results agree well with the prediction obtained from a simulation based on a non-steady-state kinetic model.
机译:乙氧基化双酚-A相对高光敏性和模量的基于二甲基丙烯酸酯基光氨氨酰BPE-100用于产生亚50nm特征。这是通过使用基于单光子光含量聚合的直接激光书写技术来实现的。通过重叠不同波长的激光束来实现超分辨率特征,以使得能量的光引发和光煅烧过程中的波长控制活化。光抗蛋白的光敏性增加促进了快速固化速度并提高了光聚合效率。使用光源蛋白BPE-100,我们在基于光含量聚合的超分辨率制造技术中首次达到40nm点,最小线宽为130nm。研究了抑制激光和曝光时间对特征尺寸的影响,结果吻合良好,从基于非稳态动力学模型获得的模拟获得。

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