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Simple Electrochemical Method for Deposition and Voltammetric Inspection of Silver Particles at the Liquid−Liquid Interface of a Thin-Film Electrode

机译:薄膜电极液 - 液界面银粒子沉积和伏安检测的简易电化学方法

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摘要

A novel experimental methodology for depositing and voltammetric study of Ag nanoparticles at the waternitrobenzeneud(W-NB) interface is proposed by means of thin-film electrodes. The electrode assembly consistsudof a graphite electrode modified with a thin NB film containing decamethylferrocene (DMFC) as a redoxudprobe. In contact with an aqueous electrolyte containing Ag+ ions, a heterogeneous electron-transfer reactionudbetween DMFC(NB) and Ag+ud(W) takes place to form DMFC+ud(NB) and Ag deposit at the W-NB interface.udBased on this interfacial reaction, two different deposition strategies have been applied. In the uncontrolledudpotential deposition protocol, the electrode is immersed into an AgNO3 aqueous solution for a certain periodudunder open circuit conditions. Following the deposition step, the Ag-modified thin-film electrode is transferredudinto an aqueous electrolyte free of Ag+ ions and voltammetrically inspected. In the second protocol theuddeposition was carried out under controlled potential conditions, i.e., in an aqueous electrolyte solutionudcontaining Ag+ ions by permanent cycling of the electrode potential. In this procedure, DMFC(NB) isudelectrochemically regenerated at the electrode surface, hence enabling continuation and voltammetric controludof the Ag deposition. Hence, the overall electrochemical process can be regarded as an electrochemical reductionudof Ag+ud(W) at the W-NB interface, where the redox couple DMFC+/DMFC acts as a mediator for shuttlingudelectrons from the electrode to the W-NB interface. Ag-particles deposited at the W-NB interface affectudthe ion transfer across the interface, which provides the basis for voltammetric inspection of the metal depositudat the liquid-liquid interface with thin-film electrodes. Voltammetric properties of thin-film electrodes areudparticularly sensitive to the deposition procedure, reflecting differences in the properties of the Ag deposit.udMoreover, this methodology is particularly suited to inspect catalytic activities of metal particles deposited atudthe liquid-liquid interface toward heterogeneous electron-transfer reactions occurring at the at the liquidliquidudinterface.
机译:提出了一种利用薄膜电极在水硝基苯 ud(W-NB)界面沉积和伏安法研究银纳米颗粒的新实验方法。电极组件由石墨电极组成,该石墨电极用含有十甲基二茂铁(DMFC)作为氧化还原 udprobe的薄NB膜改性而成。与包含Ag +离子的水性电解质接触,DMFC(NB)和Ag + ud(W)之间发生异质电子转移反应,从而在W-NB界面形成DMFC + ud(NB)和Ag沉积物。 ud基于此界面反应,已应用了两种不同的沉积策略。在不受控制的电势沉积方案中,在开路条件下将电极浸入AgNO3水溶液中一定时间 ud。在沉积步骤之后,将Ag改性的薄膜电极转移至无Ag +离子的水性电解质中并进行伏安法检查。在第二种方案中,沉积是在受控电势条件下进行的,即在含有Ag +离子的电解质水溶液中通过电极电势的永久循环进行。在此过程中,DMFC(NB)在电极表面进行了电化学电化学再生,因此能够继续和伏安法控制Ag沉积。因此,整个电化学过程可以看作是W-NB界面处的电化学还原 Ag + ud(W),其中氧化还原对DMFC + / DMFC充当介体,使电子从电极穿梭到W- NB接口。在W-NB界面处沉积的银颗粒会影响离子在整个界面上的转移,这为伏安法检查金属沉积物和通过薄膜电极的液-液界面提供了基础。薄膜电极的伏安特性对沉积过程尤为敏感,反映了Ag沉积物的特性差异。此外,该方法特别适用于检查沉积在液-液界面对金属颗粒的催化活性。异质电子转移反应发生在液-液界面。

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