Computational modelling and optimisation of the fabrication of nano-structuresusing focused ion beam and imprint forming technologies

摘要

Focused Ion Beam (FIB) and Nano-Imprint Forming (NIF) have gained recently majorinterest because of their potential to enable the fabrication of precisionengineering parts and to deliver high resolution, low-cost and high-throughputproduction of fine sub-micrometre structures respectively. Using computationalmodelling and simulation becomes increasingly important in assessingcapabilities and risks of defects with respect to product manufacturability,quality, reliability and performance, as well as controlling and optimising theprocess parameters. A computational model that predicts the milling depth asfunction of the ion beam dwell times and a number of process parameters in thecase of FIB milling is investigated and experimentally validated. The focus inthe NIF study is on modelling the material deformation and the filling of thepattern grooves during the mould pressing using non-linear large deformationfinite element analysis with hyperelastic non-compressive material behaviour.Simulation results are used to understand the risk of imperfections in thepattern replication and to identify the optimal process parameters and theirinteraction