首页> 外文OA文献 >Colloidal lithography-based fabrication of suspended nanoporous silicon nitride membranes
【2h】

Colloidal lithography-based fabrication of suspended nanoporous silicon nitride membranes

机译:基于胶体光刻的悬浮纳米多孔氮化硅膜的制备

代理获取
本网站仅为用户提供外文OA文献查询和代理获取服务,本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文,但由于OA文献来源多样且变更频繁,仍可能出现获取不到、文献不完整或与标题不符等情况,如果获取不到我们将提供退款服务。请知悉。

摘要

Nanoporous membranes provide a basis for constructing non-supported biomembranes, which enable biological processes such as ion and molecule transport through the biomembranes to be investigated under physiological conditions with ease of control. Preparation of such membranes usually requires expensive equipments and extensive experiences. In this paper, we provide a cheap and controllable scheme of high volume fabricating suspended nanoporous Si3N4 membranes on a Si wafer by combined colloidal lithography and standard Si fabrication technology including low cost ICP etching and anisotropic Si wet-etch. Si3N4 layers are grown on Si wafers. Polystyrene particles of 200-nm-diameter are then monodispersed on the Si3N4 layers based on electrostatic repulsions with an average density of 2%. This is followed by Cr masking, ICP etching and Si wet-etch processes to form suspended Si3N4 membranes with 200-nm-deep nanopores through the membranes. The well-aligned cylindrical nanopores have a low aspect radio of ca. 0.9, which would be beneficial to forming stable suspended lipid bilayers.
机译:纳米多孔膜为构建非支撑生物膜提供了基础,使生物过程如离子和分子通过生物膜的转运能够在生理条件下进行研究,并且易于控制。这种膜的制备通常需要昂贵的设备和丰富的经验。在本文中,我们提供了一种便宜且可控的方案,该方法可通过胶体光刻技术和包括低成本ICP刻蚀和各向异性Si湿法刻蚀的标准Si制造技术在Si晶片上大量制备悬浮的纳米多孔Si3N4膜。 Si3N4层在Si晶圆上生长。然后,基于静电斥力将直径为200 nm的聚苯乙烯颗粒单分散在Si3N4层上,平均密度为2%。然后进行Cr掩模,ICP蚀刻和Si湿法蚀刻工艺,以形成具有200nm深纳米孔的悬浮Si3N4膜。排列良好的圆柱纳米孔的纵横比较低。 0.9,这将有助于形成稳定的悬浮脂质双层。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号