In situ Characterization of CVD-Processes by Raman Scattering: Determination ofthe Kinetics of the Hydrogen Reduction of WF6 (In situ Karakerisatie van CVD-Processen met Behulp van Raman Verstrooiing: Bepaling van de Kinetiek van de Reactie Tussen Waterst

摘要

;Contents: General Introduction; Influence of the gasphase on the properties ofCVD tungsten films; Raman scattering; Experimental detials; Influence of temperature gradients on partial pressures; A kinetic study of the tungsten deposition from h2/WF6-mixture based on in situ partial pressure measurements.