Semiconductor Measurement Technology: Workshop on Mass Flow Measurement andControl for the Semiconductor Industry

摘要

On 15-16 May 2000 at NIST, 45 scientists and engineers met to identify researchand standards that will benefit users and manufacturers of mass flow controllers (MFCs) and related equipment. Most attendees represented companies closely associated with the semiconductor industry, including manufacturers of MFCs, of process tools, and of semiconductor devices. They were asked to: (1) Identify the technical problems limiting the productivity of the U.S. semiconductor manufacturing industry; (2) Prioritize the ways these problems can be resolved using NIST's assistance. Brief presentations were given and lengthy discussions were held on the following topics: (1) Flow meter performance; (2) Standards and calibration; (3) Gas properties; (4) Alternatives to thermal mass flow controllers. The attendees proposed 21 tasks directed at the identified problems. A subsequent vote identified the seven strongly recommended tasks listed below. These recommendations will help NIST guide its research on gas properties, flow standards, and flow measurement techniques. (1) (No institution specified): Devise a technique to verify MFC performance that is independent of the process chamber. (2) MFC manufacturers: Characterize the performance of each new MFC with nitrogen as well as with its nameplate gas; (3) NIST: Increase the range of transfer standards for conducting round-robin tests (0.01 sccm to 1000 slm). (4) NIST: Improve the primary (0.025%) and transfer (0.1%) standards for gas flow. (5) NIST: Expand and reprioritize the list of gases to be studied. Schedule and conduct property measurements; (6) NIST: Establish and maintain a public, Web-based database of gas properties; (7) NIST: Develop metrology to characterize liquid flow controllers.