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Structural Reliability of Yttria-Doped, Hot-Pressed Silicon Nitride at Elevated Temperatures

机译:氧化钇掺杂热压氮化硅在高温下的结构可靠性

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The strength of yttria-doped, hot-pressed silicon nitride was investigated as a function of temperature and applied load. Data collected at 1200C are presented in the form of a strength degradation diagram for an applied load of 350 MPa. At this temperature, the behavior of the yttria-doped material is found to be superior to that of magnesia-doped silicon nitride, in which creep results in the formation of microcracks that lead to strength degradation. By contrast, the yttria-doped material does not suffer from microcrack formation, or strength degradation at 1200C. At higher temperatures strength degradation does occur, and as a consequence, an upper limit of 1200C is recommended for yttria-doped, hot-pressed silicon nitride in structural applications.

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