X-ray Concentrator Using Layered Synthetic Microstructures for X-ray Microlithography Applications. Phase 1, Final Report

摘要

The report presents the results of the first phase of a research program to develop x-ray concentrator optics using layered synthetic microstructure (LSM) surfaces. The objective was to determine the feasibility of increasing the usable x-ray fluence of x-ray lithographic exposure systems which employ conventional x-ray source technology. Results indicate that a new class of reflective x-ray optical device offers significant potential performance improvement in the attainable fluence, contrast and spatial resolution of x-ray lithographic equipment. The main considerations in the design of x-ray exposure equipment are the exposure time, the spatial resolution, and the contrast of the resulting image. The results of the work presented in the report indicate that (1) spatial resolution and contrast can be improved with LSM reflective optics; (2) Flux enhancements can be realized with LSM reflective optics; (3) LSM reflective optics appear to be technically feasible to fabricate; and (4) the required LSM fabrication technology presently exists.