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Calculation of the Flow Field in a Radio Frequency Plasma CVD (Chemical Vapor Deposition) Reactor

机译:射频等离子体CVD(化学气相沉积)反应器中流场的计算

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A mathematical model is presented for the numerical simulation of the flow field in a radio frequency plasma CVD reactor, the main parts include a plasma torch (2.5cm radius, 22.5cm long), a reactor (2.5cm radius, 20.0cm long) and a powder collector (4.0cm radius, 20cm long) with water-cooling tank at the center. The model is based on the solution of two dimensional continuity, momentum, energy and species equations in cylindrical coordinates simultaneously with the one dimensional magnetic and electric field equations. Detailed knowledge about the velocity, species distributions and temperature field (both in the flow and in the wall which confines the flow) is obtained by the numerical method SIMPLER of Patankar and Spalding. Calculation is made under atmospheric pressure at a power level of 8.4kW. With argon as heating gas and SiCl4, NH3, H2 as reactants. Owing to the lack of related reaction rate, the chemical reaction and crystallization are not taken into account. Some comment on the flow field and several ways to improve the structure of the reactor are suggested.

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