Properties of vacuum-deposited thin-film nichrome resistors

机译：真空沉积薄膜镍铬电阻器的特性

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Properties of vacuum deposited thin film nichrome resistors for microelectronic circuit applications

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作者
Caruso, S. V.; De Haye, R. F.;
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年度 1967
页码 1-20
总页数 20
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
CIRCUITS; CONFERENCES; FABRICATION; MICROELECTRONICS; MICROMINIATURIZATION; MICROMINIATURIZED ELECTRONIC DEVICES; NICHROME (TRADEMARK); PRINTED RESISTORS; RESISTORS; THIN FILMS; VACUUM; VACUUM DEPOSITION; MICROCIRCUIT; MICROMINIATURIZED ELECTRONIC EQUIPMENT; NICHROME; PRINTED RESISTOR; THIN FILM; VACUUM DEPOSITION;

机译：集成电路;大会;制造;微电子;微型化;微粒化电子器件; NICHROmE（商标）;印刷电阻器;电阻器;薄膜;真空;真空沉积;微型电路;微粒电子设备;镍铬合金;印刷电阻器;薄膜;真空沉积;

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Properties of vacuum-deposited thin-film nichrome resistors

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