Thin Film Adhesion by Nanoindentation-Induced Superlayers

摘要

This work has analyzed the key variables of indentation tip radius, contact radius, delamination radius, residual stress and superlayer/film/interlayer properties on nanoindentation measurements of adhesion. The goal to connect practical works of adhesion for very thin films to true works of adhesion has been achieved. A review of this work titled 'Interfacial toughness measurements of thin metal films,' which has been submitted to Acta Materialia, is included.