Nanoindentation-induced interfacial fracture of ZnO thin films deposited on Si(111) substrates by atomic layer deposition

摘要

In this study, the structural and nanomechanical characteristics of ZnO thin films are investigated by mans of X-ray diffraction (XRD), atomic force microScopy (AFM) and nanoindentation techniques. The ZnO thin films are deposited on Si( 111) substrates by using atomic layer deposition (ALD). The interfacial fracture behaviors for ALD-derived ZnO thin films are characterized by Berkovich nanoindentation, and the morphologies of indentations are revealed by using Scanning electron microScopy (SEM). During nanoindentation, the interfacial fracture of ZnO thin films is significantly observed as the indentation load reaches 50 mN and, the corresponding loading segment in the load-displacement curve displays an obvious diScontinuity event. Based on the analysis of the energy release in cracking, the fracture toughness of ALD-derived ZnO thin films deposited on Si(111) substrates is calculated.