Pulsed Mode Evaluation of an Axial Geometry Cesium Sputter Negative Ion Source

摘要

An axial geometry negative ion source has been evaluated as a source of pulsed negative ion beams for possible future use of the Holifield Heavy Ion Research Facility (HHIRF) tandem accelerator as a synchrotron injector. During test stand operation and HHIRF tandem accelerator testing, high-intensity, square wave-form, 100 mu s wide, pulsed beams of Ag exp - , Au exp - , Cu exp - , Ni exp - , and O exp - were produced at peak intensity levels ranging between 100 and 350 mu A. The beam intensities were observed to increase approximately linearly with pulsed voltage amplitude over a range of voltages between 400 and 2400 V. In most cases, the pulsed and dc beam components were found to be essentially independent of each other, i.e., the dc component could be adjusted without significantly affecting the pulsed component. Pulsed exp 16 O exp - beams at peak intensities of 100 mu A were injected into the HHIRF tandem accelerator without observable effects on the operational stability of the accelerator. (ERA citation 10:034487)