CESIUM SPUTTERING TYPE NEGATIVE ION SOURCE

摘要

PROBLEM TO BE SOLVED: To provide a cesium sputtering type negative ion source in which a pipe to supply cesium vapor to a chamber containing an ionizer and a target is prevented from being cooled. ;SOLUTION: Cesium vapor produced in a reservoir 11 is supplied to a chamber 1 containing a target 7 and an ionizer 8 through a pipe 9 thermally insulated from the chamber 1. Cesium ion in the cesium vapor which has been made plasmatic by the ionizer 8 is accelerated by a voltage applied by a sputtering power source 17 to collide it against the target 7, and a molecule composing the target 7 is sputtered. The sputtered molecule is made to be a negative ion by passing it in plasma in the inside of the ionizer 8, and the negative ion is taken out by a negative ion leading electrode 16.;COPYRIGHT: (C)1999,JPO