Current Limitation and Formation of Plasma Double Layers in a Non-Uniform Magnetic Field

摘要

Formation of strong double layers has been observed experimentally in a magnetised plasma column maintained by a plasma source. The magnetic field is approximately axially homogenous except in a region at the anode where the electric current flows into a magnetic mirror. The double layer has a stationary position only in the region of non-uniform magnetic field or at the aperture separating the source and the plasma column. It is characterized by a negative differential resistance in the current-voltage characteristic of the device. The parameter space,where the double layer exists, has been studied as well as the corresponding potential profiles and fluctuation spectra. The electric current and the axial electric field are oppositely directed between the plasma source and a potential minimum which is formed in the region of inhomogeneous magnetic field. Electron reflection by the resulting potential barrier is found to be an important current limitation mechanism. (ERA citation 13:038819)