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Improved Hold-Off Characteristics of Gallium Arsenide Photoconductive Switches Used in High Power Applications.

机译:改善用于高功率应用的砷化镓光电导开关的阻断特性。

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摘要

Electron injection and the subsequent formation of a trap filled region leads to premature device failure in an opposed contact, EL2/carbon compensated GaAs photoconductive switch, made through the liquid encapsulated Czochralski process. Due to the electrostatic properties associated with a n- /semi-insulating junction, the introduction of a n+ region next to the cathode suppresses electron injection until higher bias. The doping level, length, and the thickness of the high n+ region are some of the parameters that affect hold- off characteristics. Extending the length of the n+ region well beyond the cathode does not increase the hold-off voltage but confines current flow to a narrow strip, which may trigger local heating burnout. Suppression of the effects of the EL2 traps at the n+/SI interface also does not improve the hold- off characteristics. Opposed contact switches, made from intrinsic GaAs have the characteristics of 'relaxation' semiconductors. The injection of minority carrier results in initial recombination and the formation of a large number of recombination regions may contribute to switching delays and jitters.

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