Pacifichem 2000 Symposium on Plasma Chemistry and Technology for Green Manufacturing, Pollution Control and Processing Applications

摘要

Plasma chemistry and technology represents a significant advance and improvement for green manufacturing, pollution control, and various processing applications. The US Army as well as the DoD have a very large number of operational and military needs that can be addressed by state-of-the-art plasma technologies. These include clean-up/restoration of a wide range of contaminated sites (soils and groundwater), control of release of toxic vapors during peacetime operations at military bases and depots, as well as combat applications such as decontamination of personnel clothing and materiel contaminated by CBW agents. The Pacific Basin Chemical Societies jointly organize a major Congress every five years. The Pacifichem 2000 was held from December 14-19, 2000 in Honolulu, HI. This Congress consists of over 120 symposia. amongst them the Symposium on Plasma Chemistry and Technology for Green Manufacturing, Pollution Control, and Processing Applications. This symposium was aimed at highlighting many of the new and exciting developments in the plasma chemistry many field beyond the more traditional and mature fields of semiconductor and materials processing. This symposium was focus on three areas: Pollution Control with Standard and Hybrid Non-Thermal Plasmas; Green Chemical Synthesis, Conversion, and Materials Modification; and Plasmas in Food and Agricultural applications.