Ion Implantation into Diamond for the Realization of Thin, Single- Crystal Membranes

摘要

This report results from a contract tasking Technion - Israel Institute of Technology as follows: The Grantee will use the flexible ion- implanter at the Technion (Israel) and the know-how available in Professor Kalish's group on implantation and graphitization of diamond to study the conditions of realization of free standing single crystalline diamond CVD plates. Synthetic diamond samples will be subjected to appropriate-dose, multiple-energy ion implantations to create the desired damage region. TRIM simulations of the defect profiles will be used to design the required implantation schemes. About 20 implantations will be performed (depending on required dose and number of different energy implantations required.) About 10 SIMS evaluations will be performed, if required.