Preparation of Ultra Thin Polystyrene, Polypropylene and Polyethylene Films on Si Substrate Using Spin Coating Technology

摘要

Preparation of ultra thin polystyrene, polypropylene and polyethylene films on silicon substrate using the spin coating technique is discussed in this report. The influence of various process parameters on the obtained film quality including Si wafer preparation, choice of solvent, influence of the solution concentration on the coating and sample positioning on the spin coater are shown. The polymer film surface morphology, thickness and chemical composition were analyzed by atomic force microscopy, profilometery, n&k spectrometry, ellipsometry and X-ray photoelectron spectrometry. Contact angle measurements were performed to characterize the polymer surface energy.