首页> 美国政府科技报告 >Long-Wave Infrared Semiconductor Negative Refraction Metamaterials for High-Resolution Imaging.
【24h】

Long-Wave Infrared Semiconductor Negative Refraction Metamaterials for High-Resolution Imaging.

机译:用于高分辨率成像的长波红外半导体负折射超材料。

获取原文

摘要

The authors have theoretically developed and experimentally verified a set of multilayered metamaterials with negative refraction response spanning the frequency range 8...11 microns (frequency-independent index spanning 8...9.5 microns), leading to the increase of bandwidth of negative refraction by 27%. They also designed and fabricated quantum cascade structures integrated into semiconductor metamaterials; experimental characterization indicates QC action spectrally overlapping with negative refraction region. Finally, the authors theoretically developed a system that is capable of achieving focal spots of the order of 1 micron, and a new analytical technique that can be utilized to image subwavelength objects in the far field.

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号