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ID-IE Recovery in Electron Irradiated Copper. I. Experimental.

机译:电子辐照铜中的ID-IE回收率。 I.实验。

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The ID-IE region (30 K-60 K) was studied using sequential isothermals following irradiation near 4.2 K, as a function of electron energy, E sub e, and initial defect concentration, C sub i. Resistivity was monitored almost continuously, and end point measurements were made at 4.2 K to correct for deviations from Matthiessen's rule. Using temperature-compensated (equivalent) annealing times, obtained with the factor exp(-((0.117 + or - 0.003 eV)/kT)), isothermal sections were joined to yield densely populated extended recovery profiles. The recovery is strongly E sub e-dependent for E sub e approximately 0.5 MeV, only slightly between 0.6 and 1.4 MeV. The E sub e-dependence is consistent with a model in which i-v pairs of large separations are produced in or near (110) directions. ID is independent of C sub i. The C sub i-dependence of IE requires i-i and i-impurity interactions. A three-dimensional model is fit to the 0.6 MeV data at 2, 7, and 25 ppm point defect concentration, using a Gaussian separation distribution having a mean separation of 1.6 capture radii.

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