首页> 美国政府科技报告 >Linearity and Enhanced Sensitivity of the Shipley AZ-1350B Photoresist.
【24h】

Linearity and Enhanced Sensitivity of the Shipley AZ-1350B Photoresist.

机译:shipley aZ-1350B光刻胶的线性度和增强灵敏度。

获取原文

摘要

The properties of the Shipley AZ-1350-B positive photoresist used with the Shipley AZ-303A developer were investigated. It was found that the use of AZ-303A developer results in a significant improvement of the sensitivity and the linearity of the photoresist. The unexposed etch rate of the photoresist was 35 A tor- 5 A/sec. Gratings of high efficiency have been successfully fabricated using the above combination of photoresist and developer. (Author)

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号